发明授权
- 专利标题: SOI pass gate leakage monitor
- 专利标题(中): SOI通孔泄漏监测器
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申请号: US09528350申请日: 2000-03-17
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公开(公告)号: US06437594B1公开(公告)日: 2002-08-20
- 发明人: Ronald J. Bolam , Andres Bryant , Edward J. Nowak , Minh H. Tong
- 申请人: Ronald J. Bolam , Andres Bryant , Edward J. Nowak , Minh H. Tong
- 主分类号: G01R2722
- IPC分类号: G01R2722
摘要:
A monitor for detecting pass gate leakage in a silicon on insulator device and a method for using the same is described herein. A pulse generator supplies a signal to a set of buffers connected in parallel, which pass on a signal to the source side of a series of NFETs. The plurality of NFETs are ordered by increasing channel widths. The NFETs have grounded gates, and therefore will not pass current due to field effects. Each NFET is connected to a latch, and the latches are originally set to the same state. When the signal supplied to the NFET drops from high to low, pass gate leakage will occur through the channel of each NFET. If pass gate leakage through any given NFET is sufficient, the latch will change states. The latch output signal is sent to a shift register, which can be made to output information. By incorporating the monitor on the chip, pass gate leakage tolerances and specifications can be established in-line during manufacture.
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