发明授权
US06440788B2 Implant sequence for multi-function semiconductor structure and method
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多功能半导体结构和方法的种植体序列
- 专利标题: Implant sequence for multi-function semiconductor structure and method
- 专利标题(中): 多功能半导体结构和方法的种植体序列
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申请号: US09895159申请日: 2001-07-02
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公开(公告)号: US06440788B2公开(公告)日: 2002-08-27
- 发明人: Jack A. Mandelman , Edward J. Nowak , William R. Tonti
- 申请人: Jack A. Mandelman , Edward J. Nowak , William R. Tonti
- 主分类号: H01L2710
- IPC分类号: H01L2710
摘要:
A multi-function semiconductor device is provided. The device includes a bipolar transistor and an FET formed in parallel. A semiconductor substrate is provided on an insulating layer. A source/emitter region and a drain region are formed in the semiconductor substrate and border first opposite sides of a body region therebetween. A gate is formed above the substrate between the source/emitter region and the drain region to form an FET having three terminals including the gate, the source/emitter region, and the drain region. A collector region is formed in the substrate abutting the drain region and extending further under the gate and the drain region. A bipolar transistor having three terminals is formed including a base region, the source/emitter, and the collector region. A shortest distance between the collector region and the source/emitter region defines a base width.
公开/授权文献
- US20020014664A1 Multi-function semiconductor structure and method 公开/授权日:2002-02-07
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