发明授权
US06444396B1 Ester compounds, polymers, resist composition and patterning process
有权
酯化合物，聚合物，抗蚀剂组合物和图案化工艺
- 专利标题： Ester compounds, polymers, resist composition and patterning process
- 专利标题（中）： 酯化合物，聚合物，抗蚀剂组合物和图案化工艺
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申请号： US09630810申请日： 2000-08-02
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公开(公告)号： US06444396B1公开(公告)日： 2002-09-03
- 发明人: Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
- 申请人： Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
- 优先权： JP10-145080 19980511; JP10-292575 19981014
- 主分类号： G03F7039
- IPC分类号： G03F7039
摘要：
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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