Invention Grant
- Patent Title: Coating and developing method
- Patent Title (中): 涂层和显影方法
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Application No.: US87502201Application Date: 2001-06-07
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Publication No.: US6444409B2Publication Date: 2002-09-03
- Inventor: ARAKI SHINICHIRO , MATSUMOTO SHINKO , ANAI NORIYUKI
- Applicant: TOKYO ELECTRON LTD
- Priority: JP23359698 1998-08-05
- Main IPC: H01L21/027
- IPC: H01L21/027 ; B05C11/08 ; G02B5/20 ; G03F7/00 ; G03F7/16 ; G03F7/30 ; H01L21/00 ; G02F1/1335 ; G03F7/20 ; G03F7/26
Abstract:
A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
Information query
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