发明授权
- 专利标题： Resist compositions and patterning process
- 专利标题（中）： 抗蚀剂组合物和图案化工艺
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申请号： US09534351申请日： 2000-03-24
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公开(公告)号： US06455223B1公开(公告)日： 2002-09-24
- 发明人: Jun Hatakeyama , Tomohiro Kobayashi , Osamu Watanabe , Takanobu Takeda , Toshinobu Ishihara , Jun Watanabe
- 申请人： Jun Hatakeyama , Tomohiro Kobayashi , Osamu Watanabe , Takanobu Takeda , Toshinobu Ishihara , Jun Watanabe
- 优先权： JP11-082885 19990326
- 主分类号： G03F7039
- IPC分类号： G03F7039
摘要：
A resist composition comprising a dendritic or hyperbranched polymer of a phenol derivative having a weight average molecular weight of 500-10,000,000 has an excellent resolution, reduced line edge roughness, and dry etching resistance and is useful as a chemical amplification type resist composition which may be either positive or negative working.
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