发明授权
- 专利标题: Ferromagnetic double quantum well tunnel magneto-resistance device
- 专利标题(中): 铁磁双量子阱隧道磁阻器件
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申请号: US09762804申请日: 2001-02-13
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公开(公告)号: US06456523B1公开(公告)日: 2002-09-24
- 发明人: Masaaki Tanaka , Toshiaki Hayashi
- 申请人: Masaaki Tanaka , Toshiaki Hayashi
- 优先权: JP11-196724 19990709; JP2000-022691 20000131
- 主分类号: G11C1100
- IPC分类号: G11C1100
摘要:
A ferromagnetic double quantum well tunneling magnetoresistance device is disclosed that utilizes a two-dimensional electron (positive hole) system to obtain an infinitely great magnetoresistance ratio. Also disclosed are a sensitive magnetic sensor and a nonvolatile storage device derived from that device. In structural terms of the device, a first and a second quantum well layer of ferromagnetic material (4, 8) in each of which the quantum confinement for carriers is established in a two-dimensional electron (positive hole) state are each sandwiched between a pair of barrier layers of nonmagnetic material (2, 6, 10) through which the carriers can tunnel. The first and second quantum well layers (4, 8) have a difference in coercive force so that when an external magnetic field is applied thereto only one of them may be reversed in the direction of magnetization. As a result, if magnetizations of the two quantum wells are parallel to each other, tunneling is allowed to occur, and if they are antiparallel to each other, tunneling is inhibited. A infinitely great tunneling magnetoresistance ratio is thereby obtained.
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