发明授权
US06465781B1 Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus
有权
用于基于带电粒子束成像检查或测量样品的方法和装置，以及带电粒子束装置
- 专利标题： Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus
- 专利标题（中）： 用于基于带电粒子束成像检查或测量样品的方法和装置，以及带电粒子束装置
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申请号： US09589065申请日： 2000-06-08
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公开(公告)号： US06465781B1公开(公告)日： 2002-10-15
- 发明人: Norimasa Nishimura , Akira Shimase , Masahiro Watanabe , Asahiro Kuni , Taku Ninomiya , Hiroshi Miyai
- 申请人： Norimasa Nishimura , Akira Shimase , Masahiro Watanabe , Asahiro Kuni , Taku Ninomiya , Hiroshi Miyai
- 优先权： JP11-165872 19990611
- 主分类号： G01N2300
- IPC分类号： G01N2300
摘要：
A method and an apparatus for inspecting or measuring a sample based on charged-particle beam are provided to relieve charge-up of the sample, so that high-quality electron image is obtained. A UV light irradiation optical system is controlled by an irradiation controller, scanning of the charged-particle beam is controlled by a scanning controller, and the irradiation controller and the scanning controller are controlled by a general controller. They are mutually synchronized, and a signal from an electron detector is imaged by an image slicing circuit and an image processing circuit.
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