发明授权
US06466315B1 Method and system for reticle inspection by photolithography simulation 有权
通过光刻模拟方法和系统进行掩模版检查

  • 专利标题: Method and system for reticle inspection by photolithography simulation
  • 专利标题(中): 通过光刻模拟方法和系统进行掩模版检查
  • 申请号: US09390503
    申请日: 1999-09-03
  • 公开(公告)号: US06466315B1
    公开(公告)日: 2002-10-15
  • 发明人: Avner KarpolBoaz Kenan
  • 申请人: Avner KarpolBoaz Kenan
  • 主分类号: C01N2188
  • IPC分类号: C01N2188
Method and system for reticle inspection by photolithography simulation
摘要:
A system and method are presented for optical inspection of reticles by simulating the operation of a selected stepper. The system utilizes a flying spot inspection technique and includes a scanning apparatus and a detection unit. The scanning apparatus uses a laser source similar to that of the stepper of interest. First and second light directing assemblies are accommodated in the optical paths of, respectively, incident and transmitted light, and are designed so as to provide coherence of the light substantially equal to that of the stepper.
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