发明授权
US06468859B1 Method of reducing electrical shorts from the bit line to the cell plate 失效
减少从位线到电池板的电气短路的方法

Method of reducing electrical shorts from the bit line to the cell plate
摘要:
A stress buffer and dopant barrier in the form of a TetraEthylOrthoSilicate (TEOS) film is deposited after the capacitor cell plate has been etched and cleaned to thereby eliminate electrical shorts from the bit line to the cell plate.
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