发明授权
- 专利标题: Production method of electronic parts and water treatment apparatus
- 专利标题(中): 电子零件和水处理设备的生产方法
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申请号: US09314117申请日: 1999-05-19
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公开(公告)号: US06471783B1公开(公告)日: 2002-10-29
- 发明人: Masashi Gotoh , Jitsuo Kanazawa , Syuichiro Yamamoto
- 申请人: Masashi Gotoh , Jitsuo Kanazawa , Syuichiro Yamamoto
- 优先权: JP10-155301 19980520
- 主分类号: B08B304
- IPC分类号: B08B304
摘要:
A production method of an electronic part comprising a step o working a substrate having formed thereon a metal thin-film conductor using water, wherein said water satisfies the relations 3.5≦pH≦6.5 and DO≦0.5 pH2−6.5 pH+22 [wherein DO represents a dissolved oxygen amount (unit ppm)]. By using the water in the case of working substrates in the production steps of electronic parts, the generations of the static electricity and the oxidation caused by water used for working are restrained. The present invention is particularly effective in working of an electronic part wherein a metal thin-film conductor containing at least two kinds of metals including Al on a substrate having a pyroelectric property.
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