发明授权
- 专利标题： Photocatalyst, manufacturing method therefor, and gas decomposition method
- 专利标题（中）： 光催化剂及其制备方法和气体分解方法
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申请号： US09597147申请日： 2000-06-20
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公开(公告)号： US06471929B1公开(公告)日： 2002-10-29
- 发明人: Misao Kusunoki , Tomikazu Watanabe , Shigehide Yamamichi , Masafumi Ata , Shinichi Mizuno , Matthias Ramm
- 申请人： Misao Kusunoki , Tomikazu Watanabe , Shigehide Yamamichi , Masafumi Ata , Shinichi Mizuno , Matthias Ramm
- 优先权： JP11-179291 19990625; JP2000-005116 20000114
- 主分类号： B01J800
- IPC分类号： B01J800
摘要：
A photocatalyst having superior durability; a manufacturing method for the photocatalyst and a method and apparatus for decomposing a gas, where a film which is fullerene-based but different from the evaporated fullerene film is used. The photocatalyst has a fullerene polymer film layered on a substrate. There may be carried fine metal particles on the fullerene polymer film. These fine metal particles are carried by sputtering, evaporation or coating on the fullerene polymer film. The apparatus for decomposing the gas includes a light source and a fullerene polymer film. In effecting gas decomposition, the gas to be processed is contacted with the fullerene polymer film under light illumination.
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