发明授权
- 专利标题: Methods of semiconductor processing
- 专利标题(中): 半导体加工方法
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申请号: US09835052申请日: 2001-04-13
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公开(公告)号: US06472240B2公开(公告)日: 2002-10-29
- 发明人: Salman Akram , David R. Hembree
- 申请人: Salman Akram , David R. Hembree
- 主分类号: H01L2166
- IPC分类号: H01L2166
摘要:
The present invention includes electronic device workpieces, methods of semiconductor processing and methods of sensing temperature of an electronic device workpiece. In one aspect, the invention provides an electronic device workpiece including: a substrate having a surface; a temperature sensing device borne by the substrate; and an electrical interconnect formed upon the surface of the substrate, the electrical interconnect being electrically coupled with the temperature sensing device. In another aspect, a method of sensing temperature of an electronic device workpiece includes: providing an electronic device workpiece; supporting a temperature sensing device using the electronic device workpiece; providing an electrical interconnect upon a surface of the electronic device workpiece; electrically coupling the electrical interconnect with the temperature sensing device; and sensing temperature of the electronic device workpiece using the temperature sensing device.
公开/授权文献
- US20010012639A1 Methods of semiconductor Processing 公开/授权日:2001-08-09
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