发明授权
- 专利标题: Photoelectric transducer and manufacturing method of the same
- 专利标题(中): 光电传感器及其制造方法相同
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申请号: US09689587申请日: 2000-10-13
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公开(公告)号: US06472699B1公开(公告)日: 2002-10-29
- 发明人: Iwao Sugiyama , Hiroshi Goto
- 申请人: Iwao Sugiyama , Hiroshi Goto
- 优先权: JP11-338457 19991129
- 主分类号: H01L31068
- IPC分类号: H01L31068
摘要:
A photoelectric transducer comprises elements including P- and N-type regions to perform photoelectric conversion using photovoltaic effect of the P-N junction, and MOS transistors disposed around each element. A P-type well on which the MOS transistors are formed, has a higher impurity concentration than the P-type region. The P-type region has an impurity concentration distribution in which the concentration first increases gradually in the direction toward the interior, and then decreases gradually after a predetermined point of depth, and the maximum peak value of the concentration at the predetermined point is lower than the maximum peak value of the concentration of the P-type well. It becomes possible to improve sensitivity and reduce leakage current, besides, to realize a considerable reduction in cross talk with an adjacent pixel. A high-performance and highly-reliable photoelectric transducer can be obtained thus.
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