发明授权
- 专利标题: Method for manufacturing optical filter
- 专利标题(中): 光学滤波器的制造方法
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申请号: US09383659申请日: 1999-08-26
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公开(公告)号: US06475557B1公开(公告)日: 2002-11-05
- 发明人: Kunihiko Mori , Yoshitada Katagiri
- 申请人: Kunihiko Mori , Yoshitada Katagiri
- 优先权: JP10-240130 19980826
- 主分类号: B05D506
- IPC分类号: B05D506
摘要:
A method for manufacturing an optical filter capable of manufacturing an optical filter in such a manner that the transmission wavelength varies linearly with respect to the angle &thgr; in the rotation direction of the substrate and that almost the entire range of the angle &thgr; is utilizable as the optical filter. A mask capable of being rotated relatively with respect to the substrate coaxially on a plane parallel to the substrate, which is either having an aperture extending along a radius direction with an aperture angle &phgr; or itself extending along a radius direction to cover an angle &phgr;, is provided over the substrate. Then, the mask is relatively rotated with respect to the substrate at least once at a non-constant angular speed during a formation of a single layer or multiple layers on the substrate, while depositing a dielectric material in a single layer or multiple layers on the substrate from the mask side within a deposition chamber.
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