发明授权
US06476429B2 Semiconductor device with breakdown voltage improved by hetero region
失效
具有击穿电压的半导体器件由异质区域提高
- 专利标题: Semiconductor device with breakdown voltage improved by hetero region
- 专利标题(中): 具有击穿电压的半导体器件由异质区域提高
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申请号: US09832208申请日: 2001-04-11
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公开(公告)号: US06476429B2公开(公告)日: 2002-11-05
- 发明人: Yoshiro Baba
- 申请人: Yoshiro Baba
- 优先权: JP2000-111039 20000412
- 主分类号: H01L2980
- IPC分类号: H01L2980
摘要:
A power MOSFET includes an n−-drain layer, a drain contact layer disposed on a first side of the drain layer, a p-type base layer disposed on a second side of the drain layer, and an n-source layer disposed on the base layer. A gate electrode faces, through a gate insulating film, a channel region, which is part of the base layer between the drain and source layers. Source and drain electrodes are electrically connected to the source and drain contact layers, respectively. A plurality of hetero regions having a dielectric constant higher than that of the drain layer is disposed in the drain layer between the source and drain electrodes.
公开/授权文献
- US20020008258A1 Semiconductor device and manufacturing method thereof 公开/授权日:2002-01-24
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