发明授权
- 专利标题： Apparatus for measuring pedestal and substrate temperature in a semiconductor wafer processing system
- 专利标题（中）： 用于测量半导体晶片处理系统中基座和基板温度的装置
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申请号： US09513726申请日： 2000-02-24
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公开(公告)号： US06481886B1公开(公告)日： 2002-11-19
- 发明人: Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
- 申请人： Kadthala R. Narendrnath , Liang-Guo Wang , Shamouil Shamouilian , Paul E. Luscher , Hamid Noorbakhsh
- 主分类号： G01K114
- IPC分类号： G01K114
摘要：
Apparatus for measuring wafer support assembly temperature in a semiconductor wafer processing system. The apparatus is a modular plug that is mounted to the support assembly. The plug contains a photoluminescent material that exhibits a decay in luminescence after an excitement which is indicative of the temperature of the support assembly.
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