发明授权
US06482716B1 Uniform recess depth of recessed resist layers in trench structure
有权
沟槽结构中凹陷抗蚀剂层的均匀凹陷深度
- 专利标题： Uniform recess depth of recessed resist layers in trench structure
- 专利标题（中）： 沟槽结构中凹陷抗蚀剂层的均匀凹陷深度
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申请号： US09481769申请日： 2000-01-11
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公开(公告)号： US06482716B1公开(公告)日： 2002-11-19
- 发明人: Joerg Wohlfahrt
- 申请人： Joerg Wohlfahrt
- 主分类号： H01L2176
- IPC分类号： H01L2176
摘要：
A method for forming uniform-depth recesses across areas of different trench density, in accordance with the present invention, includes providing a substrate having trenches formed therein. The substrate includes regions of different trench density. The trenches are filled with a first filler material, and the first filler material is removed from a surface of the substrate. A second filler material is formed over the surface of the substrate such that the depth of the second filler material is substantially uniform across the regions of different trench density. Recesses are formed in the trenches such that the recess depth below the surface of the substrate is substantially uniform across the regions
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