发明授权
- 专利标题： Method for manufacturing electron beam apparatus supporting member and electron beam apparatus
- 专利标题（中）： 电子束装置支撑构件和电子束装置的制造方法
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申请号： US09512266申请日： 2000-02-24
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公开(公告)号： US06485345B1公开(公告)日： 2002-11-26
- 发明人: Masahiro Fushimi
- 申请人： Masahiro Fushimi
- 优先权： JP11-048494 19990225; JP2000-046351 20000223
- 主分类号： H01J924
- IPC分类号： H01J924
摘要：
A method of manufacturing a supporting member for an electron beam apparatus including an airtight container, an electron source and the supporting member arranged in the airtight container, includes a step of heating and drawing a substrate of the supporting member. An electroconductive film is formed on a surface of the substrate in the heating and drawing step.
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