发明授权
- 专利标题： Method of fabricating crystal thin plate under micro-gravity environment
- 专利标题（中）： 在微重力环境下制造晶体薄板的方法
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申请号： US09261491申请日： 1999-03-03
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公开(公告)号： US06497762B1公开(公告)日： 2002-12-24
- 发明人: Takeshi Okutani , Hideki Minagawa , Yoshinori Nakata , Hideaki Nagai , Masaaki Suzuki , Takashi Tsurue , Yoshiho Ito
- 申请人： Takeshi Okutani , Hideki Minagawa , Yoshinori Nakata , Hideaki Nagai , Masaaki Suzuki , Takashi Tsurue , Yoshiho Ito
- 优先权： JP10-193446 19980708
- 主分类号： C30B904
- IPC分类号： C30B904
摘要：
A method of fabricating a crystal thin plate of a substance capable of forming a crystal, wherein a molten layer of the substance formed on a support is cooled in the atmosphere of an inert gas or in vacuum at a rate of 10-300° C. per second under a micro-gravity environment to solidify and crystallize the molten layer. The cooling is performed by contacting a portion of the support with a cooling medium.
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