发明授权
- 专利标题: Gas inlets for wafer processing chamber
- 专利标题(中): 晶圆处理室气体入口
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申请号: US09325597申请日: 1999-06-02
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公开(公告)号: US06500734B2公开(公告)日: 2002-12-31
- 发明人: Roger N. Anderson , Peter W. Hey , David K. Carlson , Mahalingam Venkatesan , Norma Riley
- 申请人: Roger N. Anderson , Peter W. Hey , David K. Carlson , Mahalingam Venkatesan , Norma Riley
- 主分类号: H01L2120
- IPC分类号: H01L2120
摘要:
A system for supplying processing fluid to a substrate processing apparatus having walls, the inner surfaces of which define a processing chamber in which a substrate supporting susceptor is located. The system consists of a number of fluid storages, each which stores a separate processing fluid, at least two fluid conduits along which processing fluid flows from the fluid storages to the processing apparatus and a fluid inlet which connects the fluid conduits to the processing chamber. The inlet has a separate fluid passage, corresponding to each of the fluid conduits, formed along it. Each fluid passage opens at or near an inner surface of a wall to define a fluid mixing zone, so that fluid moving along one fluid passage is prevented from mixing with fluid moving along any other passage until reaching the mixing zone.
公开/授权文献
- US20020025657A1 WAFER PROCESSING IN A CHAMBER WITH NOVEL GAS INLETS 公开/授权日:2002-02-28