发明授权
US06501185B1 Barrier cap for under bump metal 失效
阻挡金属凸块

Barrier cap for under bump metal
摘要:
A semiconductor wafer having solder bumps thereon for use in flip-chip bonded integrated circuits comprises a semiconductor substrate formed with metal bond pads at selected locations thereon, a metal electroplating buss layer or layers over the bond pads, a layer of solder-wettable under bump metal on the buss layer, a layer of barrier metal which overlies and encapsulates the solder-wettable metal, and a solder bump formed on the barrier metal.
公开/授权文献
信息查询
0/0