Invention Grant
- Patent Title: Transparent substrate and method of manufacturing the same
- Patent Title (中): 透明基材及其制造方法
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Application No.: US09804854Application Date: 2001-03-13
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Publication No.: US06503567B2Publication Date: 2003-01-07
- Inventor: Kazufumi Ogawa , Norihisa Mino , Mamoru Soga
- Applicant: Kazufumi Ogawa , Norihisa Mino , Mamoru Soga
- Priority: JP2-405755 19901225; JP3-38135 19910206
- Main IPC: B05D138
- IPC: B05D138

Abstract:
At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3—q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents —O—, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.
Public/Granted literature
- US20010044021A1 Transparent substrate and method of manufacturing the same Public/Granted day:2001-11-22
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