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US06503570B2 Cyclosilane compound, and solution composition and process for forming a silicon film 失效
环硅烷化合物，以及用于形成硅膜的溶液组成和工艺

  • Patent Title: Cyclosilane compound, and solution composition and process for forming a silicon film
  • Patent Title (中): 环硅烷化合物，以及用于形成硅膜的溶液组成和工艺
  • Application No.: US09802918
    Application Date: 2001-03-12
  • Publication No.: US06503570B2
    Publication Date: 2003-01-07
  • Inventor: Yasuo Matsuki , Satoshi Ebata
  • Applicant: Yasuo Matsuki , Satoshi Ebata
  • Priority: JP2000-069313 20000313; JP2000-069314 20000313; JP2000-164102 20000601
  • Main IPC: B05D302
  • IPC: B05D302
Cyclosilane compound, and solution composition and process for forming a silicon film
Abstract:
Silylcyclopentasilane and a solution composition for forming a silicon film containing the same, which is used for forming a silicon film on the surface of a substrate. There is also disclosed spiro[4.4] nonasilane.
Abstract(Chinese):

硅基环戊硅烷和用于形成含有它们的硅膜的溶液组合物，其用于在基材的表面上形成硅膜。 还公开了螺[4.4]壬硅烷。

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