发明授权
US06513537B1 Substrate processing method and substrate processing apparatus 失效
基板处理方法和基板处理装置

Substrate processing method and substrate processing apparatus
摘要:
The present invention relates to a method of removing a polymer veil and a metal contamination deposited on a substrate having a metal layer. First, the polymer veils are removed by a chemical liquid in an inert gas atmosphere. Subsequently, the metal contamination are removed by oxidizing the metal contamination into metal oxide contamination by mixing oxygen in a small concentration in the inert gas atmosphere, and dissolving the metal oxide contamination by the chemical liquid.
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