发明授权
- 专利标题: Reflector
- 专利标题(中): 反射器
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申请号: US09723203申请日: 2000-11-27
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公开(公告)号: US06514628B1公开(公告)日: 2003-02-04
- 发明人: Takashi Ueno
- 申请人: Takashi Ueno
- 优先权: JP11-336452 19991126
- 主分类号: F21V702
- IPC分类号: F21V702
摘要:
The object of the invention is to provide a reflector in which a reduction in high reflection factor of Ag is restricted, a stable wheatherability can be attained in a continuous manner even if it is exposed in a severe environment of high temperature and high humidity and further a high practical effect with the connecting characteristic being effectively enforced can be attained and also a high reliability is provided. The alloy reflective film made of AgPdCu alloy or AgPdTi alloy with Ag being applied as major component, with Pd being added in a range of 0.5 to 3.0 wt %, with either Cu or Ti, for example, in Al, Au, Pt, Cu, Ta, Cr, Ti, Ni, Co, Si as the third element being added in a range of 0.1 to 3.0 wt % is formed on the substrate in a predetermined film thickness (nm). As its pre-treatment, the organic ground film is applied on the substrate and the reflective film is formed on the film to enforce effectively the connecting characteristic.
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