发明授权
- 专利标题： Grating fabrication process using combined crystalline-dependent and crystalline-independent etching
- 专利标题（中）： 光栅制造工艺采用组合晶体依赖和晶体独立蚀刻
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申请号： US09669758申请日： 2000-09-26
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公开(公告)号： US06517734B1公开(公告)日： 2003-02-11
- 发明人: Lilac Muller , Kenneth Edmund Arnett , Larry Fabiny , Kristofer Stefan Josef Pister
- 申请人： Lilac Muller , Kenneth Edmund Arnett , Larry Fabiny , Kristofer Stefan Josef Pister
- 主分类号： G02B518
- IPC分类号： G02B518
摘要：
A diffraction grating is fabricated by forming two sets of parallel trenches in a crystal surface, one set with a crystalline-independent etching technique and the other made with a chemically crystalline-dependent etchant. The intersection of the two sets of trenches removes material from the crystal surface to produce an etched crystal surface that can be coated with a reflective material to form the diffraction grating or can be used as a master for batch fabrication of diffraction gratings.
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