发明授权
- 专利标题： Radiation-sensitive, positive working coating composition based on carboxylic copolymers
- 专利标题（中）： 基于羧酸共聚物的辐射敏感的正性涂料组合物
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申请号： US09903824申请日： 2001-07-12
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公开(公告)号： US06517988B1公开(公告)日： 2003-02-11
- 发明人: Gerhard Hauck , Mathias Jarek
- 申请人： Gerhard Hauck , Mathias Jarek
- 主分类号： G03F7021
- IPC分类号： G03F7021
摘要：
A radiation-sensitive composition, positive-working coating compositions useful for the preparation of lithographic printing plates and lithographic printing plate precursors comprising the composition are disclosed. The composition comprises at least one quinonediazide compound and at least one carboxylic copolymer. The compositions produce lithographic printing plates that show high print run stability.
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