发明授权
US06518661B1 Apparatus for metal stack thermal management in semiconductor devices
有权
用于半导体器件中金属堆热管理的设备
- 专利标题: Apparatus for metal stack thermal management in semiconductor devices
- 专利标题(中): 用于半导体器件中金属堆热管理的设备
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申请号: US09826576申请日: 2001-04-05
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公开(公告)号: US06518661B1公开(公告)日: 2003-02-11
- 发明人: Richard C. Blish, II , Glen Gilfeather
- 申请人: Richard C. Blish, II , Glen Gilfeather
- 主分类号: H01L23367
- IPC分类号: H01L23367
摘要:
A semiconductor apparatus includes a semiconductor body in the form of a silicon substrate havng a plurality of active devices. A metal stack including a plurality of metal layers is operatively associated with the active devices. A plurality of conductive elements are connected to the metal stack and to a substrate in the form of for example a printed circuit board. Vias connect conductive elements with respective portions of at least some of the metal layers, with the conductive elements connected to heat absorbing members within the substrate, which is in turn connected to a heat sink external to the substrate, the vias being spaced at regular intervals so as to promote heat dissipation from the metal stack therethrough to the heat absoring members and the heat sink.
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