发明授权
- 专利标题: Carrier for cleaning silicon wafers
- 专利标题(中): 用于清洗硅片的载体
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申请号: US09807907申请日: 2001-06-08
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公开(公告)号: US06520191B1公开(公告)日: 2003-02-18
- 发明人: Yoshio Iwamoto , Hiroyuki Kurokawa
- 申请人: Yoshio Iwamoto , Hiroyuki Kurokawa
- 优先权: JP10-297290 19981019
- 主分类号: B08B312
- IPC分类号: B08B312
摘要:
A carrier for receiving and holding a plurality of semiconductor wafers and permitting surfaces of the wafers to receive maximum exposure to ultrasonic waves during a wafer cleaning process in which the carrier and the wafers are immersed in a liquid medium and ultrasonic waves are generated in the liquid medium. The carrier includes two vertical sidewalls and at least three horizontal supporting rods that interconnect the sidewalls and that are collectively positioned for supporting wafers in generally upright, face to face position generally parallel to each other. At least one stabilizing rod extends horizontally between the sidewalls for limiting wafer motion relative to the carrier to steady the wafers. A series of spaced apart teeth on the stabilizing rod define troughs for receiving wafers loosely therein to prevent substantial vibratory deflections of the wafers.
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