发明授权
US06531627B2 Ester compounds, polymers, resist compositions and patterning process
有权
酯化合物，聚合物，抗蚀剂组合物和图案化工艺
- 专利标题： Ester compounds, polymers, resist compositions and patterning process
- 专利标题（中）： 酯化合物，聚合物，抗蚀剂组合物和图案化工艺
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申请号： US09842007申请日： 2001-04-26
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公开(公告)号： US06531627B2公开(公告)日： 2003-03-11
- 发明人: Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
- 申请人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
- 优先权： JP2000-127532 20000427
- 主分类号： C07C6974
- IPC分类号： C07C6974
摘要：
An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, R4 is branched or cyclic, tertiary C5-C20 alkyl group, Z is a divalent C1-C10 hydrocarbon group, and k is 0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.