发明授权
- 专利标题: Block copolymer composition, process for producing the same, and pressure-sensitive adhesive composition
- 专利标题(中): 嵌段共聚物组合物,其制造方法和压敏粘合剂组合物
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申请号: US09700119申请日: 2001-02-01
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公开(公告)号: US06534593B1公开(公告)日: 2003-03-18
- 发明人: Shigeru Komatsuzaki , Tetsuaki Matsubara , Jun Ishihara
- 申请人: Shigeru Komatsuzaki , Tetsuaki Matsubara , Jun Ishihara
- 优先权: JP10-148461 19980513
- 主分类号: C08L5302
- IPC分类号: C08L5302
摘要:
The present invention provides a composition which comprises a radial poly(aromatic vinyl)/polyisoprene block copolymer as a major component and which can be used as a more excellent pressure-sensitive ingredient. This composition is obtained by reacting a diblock polymer with a coupling agent having a functionality of 4 or higher in the presence of a coupling accelerator, and it contains (a) 1 to 34% by weight of a diblock polymer, (b) 34 to 99% by weight of a four-branch polymer, and (c) 0 to 50% by weight of a two-branch polymer and/or a three-branch polymer. The poly(aromatic vinyl)/polyisoprene block copolymer contained in the composition has a weight-average molecular weight (Mw) of 260,000 to 500,000, and the poly(aromatic vinyl)/polyisoprene block copolymer has a poly(aromatic vinyl) block content of 5 to 24% by weight.
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