中科微点-全球专利检索

  1. Login
  2. Sign Up
Invention Grant
US06538214B2 Method for manufacturing raised electrical contact pattern of controlled geometry 失效
制造受控几何形状的凸起电接触图案的方法

  • Patent Title: Method for manufacturing raised electrical contact pattern of controlled geometry
  • Patent Title (中): 制造受控几何形状的凸起电接触图案的方法
  • Application No.: US09848854
    Application Date: 2001-05-04
  • Publication No.: US06538214B2
    Publication Date: 2003-03-25
  • Inventor: Igor Y. Khandros
  • Applicant: Igor Y. Khandros
  • Main IPC: H05K702
  • IPC: H05K702
Method for manufacturing raised electrical contact pattern of controlled geometry
Abstract:
An interposer includes a substrate having opposing surfaces. Conductive terminals are disposed on both surfaces, and conductive terminals on one surface are electrically connected to conductive terminals on the opposing surface. Elongate, springable, conducive interconnect elements are fixed to conductive terminals on both surfaces.
Abstract(Chinese):

插入器包括具有相对表面的基板。 导电端子设置在两个表面上，一个表面上的导电端子电连接到相对表面上的导电端子。 细长的，弹性的，有利的互连元件固定在两个表面的导电端子上。

Public/Granted literature
Information query
Espacenet
Patent Agency Ranking
0/0