- 专利标题： Polishing composition and manufacturing and polishing methods
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申请号： US09769058申请日： 2001-01-25
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公开(公告)号： US06544307B2公开(公告)日： 2003-04-08
- 发明人: Hajime Shimamoto , Shoji Ichikawa , Katsumi Kondo , Susumu Abe , Kenji Takenouchi
- 申请人： Hajime Shimamoto , Shoji Ichikawa , Katsumi Kondo , Susumu Abe , Kenji Takenouchi
- 主分类号： C09K314
- IPC分类号： C09K314
摘要：
A polishing compound containing cocoon-shaped silica particles and crystal silica particles, and water-soluble polymers including; at least one type selected from the groups including ammonium nitrate and ammonium acetate, and at least one type selected from methylcellulose, carboxymethylcellulose, hydroxyethylcellulose, and the group including carboxymethylcellulose.