发明授权
- 专利标题: Method for laser scribing of wafers
- 专利标题(中): 激光划片方法
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申请号: US09817959申请日: 2001-03-27
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公开(公告)号: US06555447B2公开(公告)日: 2003-04-29
- 发明人: Ilan Weishauss , Ran Manor , Oded Wertheim
- 申请人: Ilan Weishauss , Ran Manor , Oded Wertheim
- 主分类号: H01L2178
- IPC分类号: H01L2178
摘要:
A method for laser scribing a semiconductor substrate with coatings on top. The method comprises the steps of focusing a laser beam on a top surface of the substrate coating; absorbing energy from the laser into the coating layer; forming a first set of scribe lines in a first direction on the substrate by scanning the laser beam across the surface of the substrate to evaporate portions of the coating layer; and forming a second set of scribe lines in a second direction on the surface of the substrate substantially orthogonal to the first set of scribe lines to evaporate portions of the layer.
公开/授权文献
- US20010054606A1 Laser scribing of wafers 公开/授权日:2001-12-27
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