- 专利标题: Electron beam apparatus and image-forming apparatus
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申请号: US09003154申请日: 1998-01-06
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公开(公告)号: US06555957B1公开(公告)日: 2003-04-29
- 发明人: Ichiro Nomura , Masato Yamanobe , Hidetoshi Suzuki , Toshihiko Takeda , Tatsuya Iwasaki
- 申请人: Ichiro Nomura , Masato Yamanobe , Hidetoshi Suzuki , Toshihiko Takeda , Tatsuya Iwasaki
- 优先权: JP5-336708 19931228
- 主分类号: H01J1749
- IPC分类号: H01J1749
摘要:
In an electron beam apparatus comprising an enclosure in which an electron-emitting device having an electron-emitting region between opposite electrodes is disposed, the electron-emitting device exhibits such a characteristic as that an emission current is uniquely determined with respect to a device voltage. The interior of the enclosure is maintained under an atmosphere effective to prevent structural changes of the electron-emitting device. An image-forming apparatus comprises an enclosure in which an electron source and an image-forming member are disposed, the electron source comprising the above electron-emitting device. An emission current is stable with a very small change in the amount of electrons emitted, a sharp image is produced with high contrast, and gradation control is easily carried out.
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