- 专利标题: Low pressure vapor phase deposition of organic thin films
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申请号: US10125400申请日: 2002-04-19
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公开(公告)号: US06558736B2公开(公告)日: 2003-05-06
- 发明人: Stephen R. Forrest , Paul E. Burrows , Vladimir S. Ban
- 申请人: Stephen R. Forrest , Paul E. Burrows , Vladimir S. Ban
- 主分类号: C23C1424
- IPC分类号: C23C1424
摘要:
Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
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