发明授权
- 专利标题: Additives for inhibiting gas hydrate formation
- 专利标题(中): 用于抑制气体水合物形成的添加剂
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申请号: US09562931申请日: 2000-05-02
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公开(公告)号: US06566309B1公开(公告)日: 2003-05-20
- 发明人: Peter Klug , Michael Feustel
- 申请人: Peter Klug , Michael Feustel
- 优先权: DE19920152 19990503
- 主分类号: C09K300
- IPC分类号: C09K300
摘要:
The invention relates to the use of compounds of the formula (1) in which R1 is C1-C30-alkyl, C2-C30-alkenyl or a group of the formula —CH2—CO—NR2R3 or a C6-C18-aryl radical which may be substituted by a C1-C12-alkyl group, R2, R3 independently of one another, are hydrogen, C1-C6-alkyl or C5-C7-cycloalkyl, or R2 and R3, including the nitrogen atom to which they are bonded, form a ring of 4 to 8 ring atoms, it being possible for the ring also to contain oxygen or nitrogen atoms in addition to carbon atoms, A is a C2-C4-alkylene radical and n is an integer from 1 to 20, as gas hydrate inhibitors.
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