发明授权
- 专利标题: Negative working chemical amplification type resist compositions
- 专利标题(中): 负工作化学放大型抗蚀剂组合物
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申请号: US09584149申请日: 2000-05-31
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公开(公告)号: US06569596B1公开(公告)日: 2003-05-27
- 发明人: Yasunori Uetani , Airi Yamada , Hiroki Inoue
- 申请人: Yasunori Uetani , Airi Yamada , Hiroki Inoue
- 优先权: JP11-154947 19990602
- 主分类号: G03F7004
- IPC分类号: G03F7004
摘要:
A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula (I): wherein R represents an unsubstituted or substituted alkyl, an alicyclic hydrocarbon residue, an aryl or a camphor group, and an acid generator other than the above N-substituted succinimide compound is provided.