发明授权
- 专利标题: Structures and structure forming methods
- 专利标题(中): 结构和结构形成方法
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申请号: US09458758申请日: 1999-12-10
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公开(公告)号: US06573023B2公开(公告)日: 2003-06-03
- 发明人: John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
- 申请人: John Michiels , David Wells , Eric J. Knappenberger , James J. Alwan
- 主分类号: G03C500
- IPC分类号: G03C500
摘要:
The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.
公开/授权文献
- US20020076620A1 STRUCTURES AND STRUCTURE FORMING METHODS 公开/授权日:2002-06-20
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