Invention Grant
- Patent Title: Ammonium salt of organic acid and resist composition containing the same
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Application No.: US09801742Application Date: 2001-03-09
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Publication No.: US06573024B2Publication Date: 2003-06-03
- Inventor: Sheng-Yueh Chang , Jian-Hong Chen , Ting-Chun Liu , Tzu-Yu Lin , Wen-Yuang Tsai
- Applicant: Sheng-Yueh Chang , Jian-Hong Chen , Ting-Chun Liu , Tzu-Yu Lin , Wen-Yuang Tsai
- Priority: TW89128174A 20001228
- Main IPC: G03F7004
- IPC: G03F7004

Abstract:
The present invention provides a novel ammonium salt of an organic acid. When the salt is used as a base additive for a chemically amplified resist, the environmental stability of the resist can be enhanced, and the T-top phenomenon can be effectively prevented. In addition, the line width change caused by acid diffusion can be prevented, and the E0 value of the resist can be decreased.
Public/Granted literature
- US20020086234A1 Ammonium salt of organic acid and resist composition containing the same Public/Granted day:2002-07-04
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