- 专利标题： Structure for lithographic focus control features
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申请号： US09683551申请日： 2002-01-17
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公开(公告)号： US06577406B2公开(公告)日： 2003-06-10
- 发明人: James A. Bruce , Orest Bula , Emily E. Fisch
- 申请人： James A. Bruce , Orest Bula , Emily E. Fisch
- 主分类号： G01B1100
- IPC分类号： G01B1100
摘要：
A control target structure and method for monitoring the lithographic affects on minimum feature in a lithographic process. The control target uses line array elements having a nominal width. By changing the shape of the line-ends of the elements the control target can be optimized for controlling either focus or dose.
公开/授权文献
- US20020122187A1 Structure for lithographic focus control features 公开/授权日：2002-09-05
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