发明授权
- 专利标题: Method of cleaning of harmful gas and cleaning apparatus
- 专利标题(中): 清洁有害气体和清洁设备的方法
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申请号: US09716401申请日: 2000-11-21
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公开(公告)号: US06579509B1公开(公告)日: 2003-06-17
- 发明人: Kenji Otsuka , Naoki Muranaga , Satoshi Arakawa , Tomohisa Ikeda
- 申请人: Kenji Otsuka , Naoki Muranaga , Satoshi Arakawa , Tomohisa Ikeda
- 优先权: JP11-340264 19991130
- 主分类号: A62D300
- IPC分类号: A62D300
摘要:
Disclosed is a method for cleaning of the harmful gas, the method comprising mixing harmful gas, discharged from reaction processes using organic metal compounds as the reaction raw materials, with oxygen or air and thereafter bringing the mixture into contact with a catalyst obtained by carrying a noble metal on an inorganic support, a catalyst comprising at least one metal oxide selected from vanadium oxide, chromium oxide, manganese oxide, iron oxide, copper oxide, silver oxide, cobalt oxide and nickel oxide or a catalyst obtained by carrying the metal oxide on an inorganic support, at temperatures between 100° C. and 800° C. to clean the harmful gas. Disclosed also is an apparatus used in the method. The invention ensures that harmful components can be purified in an efficient manner without discharging organic compounds and a large amount of carbon dioxide after the harmful gas is purified, requiring no aftertreatment.
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