发明授权
US06587262B1 UV synthetic silica glass optical member and reduction projection exposure apparatus using the same
有权
UV合成石英玻璃光学构件和使用其的还原投影曝光装置
- 专利标题： UV synthetic silica glass optical member and reduction projection exposure apparatus using the same
- 专利标题（中）： UV合成石英玻璃光学构件和使用其的还原投影曝光装置
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申请号： US09686907申请日： 2000-10-12
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公开(公告)号： US06587262B1公开(公告)日： 2003-07-01
- 发明人: Seishi Fujiwara , Norio Komine , Hiroki Jinbo
- 申请人： Seishi Fujiwara , Norio Komine , Hiroki Jinbo
- 优先权： JP11-037670 19990216
- 主分类号： G02B1314
- IPC分类号： G02B1314
摘要：
This invention provides a synthetic silica glass optical member used together with light having a specific wavelength of 250 nm or less, in which the difference between the maximum value and the minimum value of transmittance [%/cm] per cm in thickness for the light in a predetermined direction within a plane perpendicular to the optical axis is 2.0%/cm or less.