发明授权
- 专利标题: Electron-emitting device, and electron beam-generating apparatus and image-forming apparatus employing the device
- 专利标题(中): 电子发射装置和电子束发生装置以及采用该装置的成象装置
-
申请号: US08418093申请日: 1995-04-06
-
公开(公告)号: US06593950B2公开(公告)日: 2003-07-15
- 发明人: Ichiro Nomura , Hidetoshi Suzuki , Takashi Noma , Yoshikazu Banno , Rie Ueno , Naoto Nakamura
- 申请人: Ichiro Nomura , Hidetoshi Suzuki , Takashi Noma , Yoshikazu Banno , Rie Ueno , Naoto Nakamura
- 优先权: JP3-260361 19911008; JP4-268714 19921007
- 主分类号: B41J2415
- IPC分类号: B41J2415
摘要:
An electron-emitting device having an electron-emitting region between electrodes on a substrate where the electron-emitting region contains fine particles dispersed therein at an areal occupation ratio of the fine particles ranging from 20% to 75% of the electron-emitting region is disclosed. The other electron-emitting device where the electron-emitting region contains fine particles being arranged at gaps of from 5 Å to 100 Å and having average particle diameter of from 5 Å to 1000 Å is also disclosed. Electron beam-generating apparatus and image-forming apparatus comprise one of the electron-emitting regions and a modulation means for modulating the electron beams emitted from the electron-emitting devices in accordance with information signals.
公开/授权文献
信息查询