发明授权
US06596042B1 Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
有权
形成用于化学机械抛光浆料的颗粒的方法和通过该方法形成的颗粒
- 专利标题： Method of forming particles for use in chemical-mechanical polishing slurries and the particles formed by the process
- 专利标题（中）： 形成用于化学机械抛光浆料的颗粒的方法和通过该方法形成的颗粒
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申请号： US09992485申请日： 2001-11-16
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公开(公告)号： US06596042B1公开(公告)日： 2003-07-22
- 发明人: Xiangdong Feng , Yie-Shein Her
- 申请人： Xiangdong Feng , Yie-Shein Her
- 主分类号： C09K314
- IPC分类号： C09K314
摘要：
The present invention provides a process for producing particles suitable for use as abrasives in chemical-mechanical polishing slurries. The process according to the invention includes adding a crystallization promoter such as Ti[OCH(CH3)2)]4 to an aqueous cerium salt solution, adjusting the pH of the solution to higher than 7.0 using one or more bases, and subjecting the solution to hydrothermal treatment at a temperature of from about 90° C. to about 500° C. to produce the particles.
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