发明授权
- 专利标题： Sputtering target, transparent conductive film, and method for producing the same
- 专利标题（中）： 溅射靶，透明导电膜及其制造方法
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申请号： US09622069申请日： 2000-08-31
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公开(公告)号： US06596135B1公开(公告)日： 2003-07-22
- 发明人: Akira Mitsui
- 申请人： Akira Mitsui
- 优先权： JP10-053899 19980305
- 主分类号： C23C1434
- IPC分类号： C23C1434
摘要：
A sputtering target which comprises an oxide containing Zn, Al and Y, which can be used for a DC sputtering method, and with which a transparent conductive film having a resistivity of from 10−2 to 1010 &OHgr;·cm can be produced stably, and a transparent conductive film which comprises an oxide containing Zn, Al and Y, and which has a resistivity of from 10−2 to 1010 &OHgr;·cm and a low light absorptivity.
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