发明授权
US06596463B2 Ester compounds, polymers, resist compositions and patterning process
有权
酯化合物，聚合物，抗蚀剂组合物和图案化工艺
- 专利标题： Ester compounds, polymers, resist compositions and patterning process
- 专利标题（中）： 酯化合物，聚合物，抗蚀剂组合物和图案化工艺
-
申请号： US09837219申请日： 2001-04-19
-
公开(公告)号： US06596463B2公开(公告)日： 2003-07-22
- 发明人: Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
- 申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
- 优先权： JP2000-119410 20000420
- 主分类号： C07C6974
- IPC分类号： C07C6974
摘要：
An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, k is 0 or 1, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom and which may contain a hetero atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.
公开/授权文献
信息查询
