Invention Grant
- Patent Title: Thin film transistor including polycrystalline active layer and method for fabricating the same
- Patent Title (中): 包括多晶有源层的薄膜晶体管及其制造方法
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Application No.: US09826446Application Date: 2001-04-04
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Publication No.: US06596573B2Publication Date: 2003-07-22
- Inventor: Seok Woon Lee , Seung Ki Joo
- Applicant: Seok Woon Lee , Seung Ki Joo
- Priority: KR2000-64352 20001031
- Main IPC: H01L2184
- IPC: H01L2184

Abstract:
A thin film transistor (TFT) including a polycrystalline active layer and a method for making the same are disclosed. An amorphous silicon layer is deposited on a substrate and is crystallized by using MJLC (metal induced lateral crystallization) to provide a poly-silicon active layer of the TFT. Specifically, the amorphous silicon layer is poly-crystallized during a thermal treatment of the active layer. The thermal treatment causes the MILC of the active layer propagating from portions of the source and the drain regions on which MILC source metal is formed through the contact holes of the TFT.
Public/Granted literature
- US20020074548A1 Thin film transistor including polycrystalline active layer and method for fabricating the same Public/Granted day:2002-06-20
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