- 专利标题: Method and apparatus for measuring wavefront aberrations
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申请号: US09850942申请日: 2001-05-08
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公开(公告)号: US06598974B2公开(公告)日: 2003-07-29
- 发明人: Larry G. Jones , Denwood Ross
- 申请人: Larry G. Jones , Denwood Ross
- 主分类号: A61B310
- IPC分类号: A61B310
摘要:
An apparatus and method for measuring wavefront aberrations. A beam splitter separates the aberrated wavefront into two components, mirror arrays focus each of the components to a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and an imaging device detects the discrete lines to determine wavefront aberrations. The method includes separating the wavefront into two components, focusing each of the components into a plurality of discrete lines with the discrete lines of one component having a different orientation than the discrete lines of the other component, and detecting information related to the discrete lines.
公开/授权文献
- US20020167642A1 Method and apparatus for measuring wavefront aberrations 公开/授权日:2002-11-14
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