Invention Grant
US06606802B2 Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas
失效
使用热热气体的高密度等离子体处理室中的清洁效率提高
- Patent Title: Cleaning efficiency improvement in a high density plasma process chamber using thermally hot gas
- Patent Title (中): 使用热热气体的高密度等离子体处理室中的清洁效率提高
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Application No.: US09998078Application Date: 2001-11-30
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Publication No.: US06606802B2Publication Date: 2003-08-19
- Inventor: Gurtej S. Sandhu , Michael Li , Neal R. Rueger
- Applicant: Gurtej S. Sandhu , Michael Li , Neal R. Rueger
- Main IPC: F26B300
- IPC: F26B300

Abstract:
Method and apparatus are disclosed for improving the cleaning efficiency of a high density plasma system by introducing thermally hot gases to heat downstream chamber walls to improve the fluorine attack on deposit coatings. In certain embodiments of the invention, the cleaning gas and thermally hot gas are allowed into the region of the high vacuum pump to provide cleaning of the high vacuum pump.
Public/Granted literature
- US20030101613A1 CLEANING EFFICIENCY IMPROVEMENT IN A HIGH DENSITY PLASMA PROCESS CHAMBER USING THERMALLY HOT GAS Public/Granted day:2003-06-05
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